Sunnyvale, CA, United States of America

Kreistler S Y Lau


Average Co-Inventor Count = 4.0

ph-index = 2

Forward Citations = 14(Granted Patents)


Company Filing History:


Years Active: 2004

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2 patents (USPTO):Explore Patents

Title: Innovations by Kreistler S Y Lau

Introduction

Kreistler S Y Lau is an accomplished inventor based in Sunnyvale, California. He has made significant contributions to the field of semiconductor materials, particularly through his innovative patents. With a total of two patents to his name, Lau's work focuses on enhancing the performance of dielectric materials used in electronic devices.

Latest Patents

Lau's latest patents revolve around the use of polycarbosilane adhesion promoters for low dielectric constant polymeric materials. These innovations effectively enhance the adhesion of low k poly(arylene ether) dielectric coating compositions. The process involves preparing a coating composition by providing a poly(arylene ether) composition and adding a small effective adhesion promoting amount of certain polycarbosilanes. The adhesion-enhanced coating compositions are then cured by heat treatment at temperatures exceeding 50°C. This results in a polycarbosilane-modified poly(arylene ether) polymer composition that possesses a low k dielectric constant, making it suitable for use in semiconductor devices.

Career Highlights

Kreistler S Y Lau is currently employed at Honeywell International Inc., where he continues to develop innovative solutions in the field of materials science. His expertise in polymer chemistry and semiconductor technology has positioned him as a valuable asset to his team and the industry.

Collaborations

Lau has collaborated with notable colleagues, including Tian-An Chen and Anna M George. Their combined efforts have contributed to advancements in the development of adhesion promoters and dielectric materials.

Conclusion

Kreistler S Y Lau's contributions to the field of semiconductor materials through his innovative patents demonstrate his commitment to advancing technology. His work not only enhances the performance of electronic devices but also showcases the importance of collaboration in scientific research.

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