Eindhoven, Netherlands

Johannes Mathias Theodorus Antonius Adriens



Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 106(Granted Patents)


Company Filing History:


Years Active: 2008

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1 patent (USPTO):Explore Patents

Certainly! Here is the article:

Title: Innovator Spotlight: Johannes Mathias Theodorus Antonius Adriens

Introduction:

Johannes Mathias Theodorus Antonius Adriens, hailing from Eindhoven, NL, is a distinguished inventor in the field of lithographic projection apparatus. With a keen focus on precision and efficiency, he has made significant contributions to the industry.

Latest Patents:

Johannes has successfully patented a cutting-edge "Lithographic apparatus and method for determining Z position errors/variations and substrate table flatness." This patent showcases his innovative approach towards improving the accuracy and performance of lithographic projection systems.

Career Highlights:

Currently employed at ASML Netherlands B.V., Johannes excels in pushing the boundaries of technological advancements. His dedication to refining lithographic processes has positioned him as a trailblazer in the industry.

Collaborations:

Throughout his career, Johannes has collaborated with top-tier professionals in the field. Notable coworkers include Willem Herman Gertruda Anna Koenen and Arthur Winfried Eduardus Minnaert, with whom he has shared ideas and expertise to drive innovation forward.

Conclusion:

In conclusion, Johannes Mathias Theodorus Antonius Adriens stands out as a visionary inventor whose work has reshaped the landscape of lithographic technology. His commitment to excellence and precision underscores his reputation as a leading figure in the field.

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