Ji Ho Eom

Title: Innovations of Ji Ho Eom in Graphene Technology

Introduction

Ji Ho Eom is a notable inventor based in Daejeon, South Korea. He has made significant contributions to the field of graphene technology, particularly in methods for depositing large-area graphene layers. His innovative approaches have the potential to advance various applications in electronics and materials science.

Latest Patents

Ji Ho Eom holds a patent for a "Method for depositing large-area graphene layer and apparatus for continuous graphene deposition." This patent describes a method that includes forming a titanium (Ti) layer on a substrate through sputtering. The process involves reducing the titanium layer by spraying a reductant gas containing hydrogen and a purge gas while moving in a specific direction. Additionally, graphene is formed by spraying a reactant gas containing a graphene source onto the titanium layer, which is also done while moving in the opposite direction.

Career Highlights

Eom is associated with Kuk-il Graphene Co., Ltd., where he applies his expertise in graphene deposition techniques. His work has been instrumental in developing efficient methods for producing high-quality graphene, which is crucial for various technological advancements.

Collaborations

Ji Ho Eom has collaborated with notable colleagues, including Dong Ho Yoon and Chul Kyu Song. Their combined efforts contribute to the innovative research and development in the field of graphene technology.

Conclusion

Ji Ho Eom's contributions to graphene technology through his patented methods highlight his role as a key inventor in this field. His work not only enhances the understanding of graphene deposition but also paves the way for future innovations in materials science.