Jet-Rung Chang

Title: Jet-Rung Chang: Innovator in Semiconductor Technology

Introduction

Jet-Rung Chang is a prominent inventor based in Taichung, Taiwan. He has made significant contributions to the field of semiconductor technology, showcasing his expertise through innovative patents. His work focuses on enhancing semiconductor structures, which are crucial for modern electronic devices.

Latest Patents

Jet-Rung Chang holds a patent for a semiconductor structure designed for substrate separation and the method for manufacturing the same. This semiconductor structure includes a temporary substrate, a first semiconductor layer positioned on the temporary substrate, and a dielectric layer featuring a plurality of patterned nano-scaled protrusions. The design allows for an etching process that separates the first and second semiconductor layers, facilitating the transfer of the second semiconductor layer to a permanent substrate. This innovation is pivotal in improving the efficiency and performance of semiconductor devices. He has 1 patent to his name.

Career Highlights

Throughout his career, Jet-Rung Chang has worked with Design Express Limited, where he has been able to apply his knowledge and skills in semiconductor technology. His contributions have been instrumental in advancing the company's capabilities in this competitive field.

Collaborations

Jet-Rung Chang has collaborated with notable colleagues, including Chun-Yen Chang and Po-Min Tu. These partnerships have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

Jet-Rung Chang is a key figure in the semiconductor industry, with a focus on innovative structures that enhance device performance. His patent and collaborative efforts reflect his commitment to advancing technology in this vital sector.