Hyung Ryul Park

Title: Hyung Ryul Park: Innovator in Indium Tin Oxide Technology

Introduction

Hyung Ryul Park is a notable inventor based in Suwon-si, South Korea. He has made significant contributions to the field of materials science, particularly in the development of indium tin oxide (ITO) technologies. With a total of 2 patents to his name, Park's work has implications for various applications in electronics and optoelectronics.

Latest Patents

Hyung Ryul Park's latest patents focus on the advancements in indium tin oxide targets and their manufacturing processes. His patents include a method for manufacturing an indium tin oxide target and a transparent conductive film of ITO. The ITO target is designed to include at least one oxide selected from the group consisting of SmO and YbO, with the oxide's amount ranging from about 0.5 wt. % to about 10 wt. % based on the weight of the target. These innovations aim to enhance the performance and efficiency of transparent conductive films used in various electronic devices.

Career Highlights

Park is currently employed at Samsung Corning Precision Materials Co., Ltd., where he continues to push the boundaries of material innovation. His work at this leading company has allowed him to collaborate with other experts in the field and contribute to cutting-edge research and development.

Collaborations

Some of his notable coworkers include Han Ho Yoon and Ju Ok Park. Their collaborative efforts have further advanced the research and development of ITO technologies, fostering an environment of innovation and creativity.

Conclusion

Hyung Ryul Park's contributions to the field of indium tin oxide technology exemplify the impact of dedicated inventors in advancing material science. His patents and ongoing work at Samsung Corning Precision Materials Co., Ltd. highlight the importance of innovation in the electronics industry.