Hongmei Wen

Title: Innovations of Hongmei Wen in Photocatalysis

Introduction

Hongmei Wen is an accomplished inventor based in South Windsor, CT (US). He has made significant contributions to the field of photocatalysis, particularly with his innovative approach to siloxane resistant ultraviolet photocatalysts. His work has implications for various applications, enhancing the efficiency and durability of photocatalytic materials.

Latest Patents

Hongmei Wen holds 1 patent for his invention titled "Siloxane resistant ultra violet photocatalysts." This patent describes a method for formulating deactivation resistant photocatalysts by coating photocatalyst crystals onto a suitable substrate. The unique aspect of his invention lies in the doping of these crystals with a dopant M, which can either repel or attract silicon-based compounds. The dopant is uniformly distributed within the photocatalyst crystals and is introduced at a depth of about 0.1 to 2 nanometers below the surface. This innovative approach allows for the interdispersion of doped and non-doped photocatalyst crystals, enhancing their overall performance.

Career Highlights

Hongmei Wen is currently employed at Carrier Corporation, where he continues to develop and refine his innovative technologies. His work at Carrier Corporation has positioned him as a key player in advancing photocatalytic solutions that address modern challenges in material science.

Collaborations

Hongmei has collaborated with notable colleagues, including Thomas Henry Vanderspurt and Susanne Marie Opalka. These collaborations have fostered a dynamic environment for innovation and have contributed to the successful development of his patented technologies.

Conclusion

Hongmei Wen's contributions to the field of photocatalysis exemplify the impact of innovative thinking in technology. His patented work on siloxane resistant photocatalysts showcases his commitment to advancing material science and addressing real-world challenges.