Hironori Mizuta

Title: Hironori Mizuta: Innovator in Semiconductor Cleaning Solutions

Introduction

Hironori Mizuta is a notable inventor based in Kawagoe, Japan. He has made significant contributions to the field of semiconductor cleaning technology. His innovative approach addresses critical challenges in maintaining the performance of cleaning agents used in semiconductor manufacturing.

Latest Patents

Mizuta holds a patent for a "Kit for cleaning agent and method for preparing cleaning agent." This invention provides a solution for preparing a cleaning agent that retains its impurity removal performance even after long-term storage. The kit is specifically designed for cleaning semiconductor substrates that have undergone a Chemical Mechanical Planarization (CMP) process. The cleaning agent has a pH range of 7.5 to 13.0 and consists of an acidic first liquid and an alkaline second liquid, ensuring effective cleaning capabilities.

Career Highlights

Hironori Mizuta is associated with Fujifilm Corporation, where he applies his expertise in developing advanced cleaning solutions for the semiconductor industry. His work has been instrumental in enhancing the efficiency and reliability of cleaning agents used in semiconductor manufacturing processes.

Collaborations

Mizuta collaborates with talented professionals in his field, including Satoshi Shirahata and Takahiro Yokomizo. These collaborations foster innovation and contribute to the development of cutting-edge cleaning technologies.

Conclusion

Hironori Mizuta's contributions to semiconductor cleaning technology exemplify the importance of innovation in maintaining the performance of cleaning agents. His patent and work at Fujifilm Corporation highlight his commitment to advancing the semiconductor industry.