Donald K Stemple

Title: The Innovations of Donald K. Stemple

Introduction

Donald K. Stemple is a notable inventor based in Tempe, AZ (US). He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work has been instrumental in advancing methods used in the manufacturing and processing of semiconductor materials.

Latest Patents

Stemple's latest patents include a method for detecting the endpoint of the etch of epitaxially grown silicon. This innovative method utilizes a monitor wafer to determine the endpoint of the working wafers' epitaxial layer during the etching process. Additionally, he has developed a method for cleaning semiconductor wafers prior to the sputter deposition of a metal. This involves introducing a mixture of ninety percent argon and ten percent freon to effectively remove unwanted oxide from the wafers.

Career Highlights

Donald K. Stemple has had a distinguished career at Motorola Corporation, where he has applied his expertise in semiconductor technology. His work has contributed to the development of advanced manufacturing processes that enhance the efficiency and effectiveness of semiconductor production.

Collaborations

Throughout his career, Stemple has collaborated with notable colleagues, including Andrew G. Nagy and Clarence J. Tracy. These collaborations have fostered innovation and have led to the successful development of various technologies in the semiconductor field.

Conclusion

In summary, Donald K. Stemple is a prominent inventor whose work in semiconductor technology has led to significant advancements. His patents and contributions continue to influence the industry, showcasing his dedication to innovation and excellence.