Bong Seong Kim

Title: Innovations of Bong Seong Kim in Plasma Processing Technology.

Introduction

Bong Seong Kim is a notable inventor based in Miyagi, Japan. He has made significant contributions to the field of plasma processing technology. His innovative work has led to the development of a unique plasma processing apparatus that enhances the efficiency of various applications.

Latest Patents

Bong Seong Kim holds a patent for a plasma processing apparatus and method. This apparatus includes a plasma processing chamber, a substrate support with a lower electrode, a source RF generator, and a bias DC generator. The source RF generator is designed to generate a source RF signal that alternates between high and low states. Meanwhile, the bias DC generator produces a bias DC signal that alternates between ON and OFF states. Each ON state consists of multiple cycles, with each cycle featuring a first sequence of first pulses and a second sequence of second pulses. The first pulses operate at a first voltage level, while the second pulses operate at a different voltage level.

Career Highlights

Bong Seong Kim is currently employed at Tokyo Electron Limited, a leading company in the semiconductor and electronics manufacturing industry. His work at this organization has allowed him to further develop his expertise in plasma processing technologies.

Collaborations

Bong Seong Kim has collaborated with notable colleagues, including Ken Kobayashi and Mitsunori Ohata. These collaborations have contributed to the advancement of innovative technologies in their field.

Conclusion

Bong Seong Kim's contributions to plasma processing technology exemplify the impact of innovation in the industry. His patent and work at Tokyo Electron Limited highlight his role as a significant inventor in this specialized field.